| 摘要 |
PROBLEM TO IMPLEMENT A MASTER DISC MANUFACTURING METHOD IN WHICH THE FILM THICKNESS DISTRIBUTION OF A SOFT MAGNETIC FILM EMBEDDED IN GROOVES HAVING A SUB-MICRON WIDTH IS IMPROVED.SOLVING MEANS LIGHT EXPOSURE CORRESPONDING TO A PREDETERMINED MAGNETIC PATTERN IS CARRIED OUT ON THE SURFACE OF A PHOTORESIST (12) ON A SILICON SUBSTRATE (10) TO EXPOSE THE SURFACE OF THE PHOTORESIST (12) TO LIGHT (C). THE RESIST FACE IS IMMERSED IN DEVELOPING LIQUID, AND THE LIGHT-EXPOSED RESIST IS REMOVED (D). SiO2 FILM (11) EXPOSED IS ETCHED, THE ETCHING PROGRESS IS STOPPED AT THE TIME POINT WHEN THE SURFACE OF THE SUBSTRATE (10) APPEARS, AND A PATTERN FORMED ON THE PHOTORESIST (12) IS TRANSFERRED TO THE SiO2 FILM (11) (E). THE PHOTORESIST (12) IS REMOVED BY HEATING TO FORM A MASK OF SiO2 FILM (11) (F). THE PREDETERMINED PATTERN PORTION AT WHICH THE SUBSTRATE (10) IS EXPOSED IS ETCHED BY THIS MASK TO FORM GROOVE PORTIONS (13) HAVING A PREDETERMINED DEPTH (G). THE SOFT MAGNETIC FILM (14) IS SPUTTERED ON THE GROOVE PORTIONS (13) OF THE SUBSTRATE (10) AND THE RESIDUAL SiO2 FILM (11), THEREBY EMBEDDING THE SOFT MAGNETIC FILM (14) INTO THE GROOVE PORTIONS (13) (H).(FIG 11)
|
