POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE

摘要

POLYCYCLIC POLYMERS CONTAINING PENDANT AROMATIC MOIETIES ARE DISCLOSED. THE POLYMERS EXHIBIT LIGHT TRANSPARENCY PROPERTIES TO DEEP UV WAVE LENGTHS MAKING THEM USEFUL FOR HIGH RESOLUTION PHOTOLITHOGRAPHIC APPLICATIONS. THESE POLYMERS ARE PARTICULARLY USEFUL IN CHEMICALLY AMPLIFIED POSITIVE AND NEGATIVE TONE RESISTS.