Illumination system for microlithography projection exposure system, has lens group with zoom systems connected one after other such that entrance light distribution in entrance surface is transferred into withdrawal light distribution

摘要

The system has a variable lens group (130) with an entrance surface for receiving light of a primary light source and a withdrawal surface (110) for withdrawal of the light. The variable lens group is arranged completely on a side of a pupil formation surface of an illumination system, where the lens group has optical systems e.g. zoom systems (134, 136). The zoom systems are connected one after the other such that entrance light distribution in the entrance surface is transferred into a withdrawal light distribution in the withdrawal surface by three fourier-transformations. An independent claim is also included for a projection exposure method.