LIQUID PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a liquid processing apparatus without requiring provision of a special isolation mechanism for exhaust and drain, capable of making the footprint small.

SOLUTION: The liquid processing apparatus includes: a substrate holding member 1 configured to rotate along with a substrate W wherein the substrate W is held in a horizontal state; a rotary cup 3 configured to surround the substrate W held on the substrate holding member 1 and to rotate along with the substrate W; a motor 2 configured to integrally rotate the rotary cup 3 and the substrate holding member 1; a surface process liquid supply nozzle 4 configured to supply a process liquid onto the substrate W; and an exhaust/drain section 6 configured to perform gas-exhausting and liquid-draining of the rotary cup 3. The exhaust/drain section 6 includes: an annular drain cup 41 configured to mainly take in and drain the process liquid shaken off from the substrate W; and an exhaust cup 42 surrounding the drain cup 41 and configured to mainly take in and discharge gas components from inside and around the rotary cup 3. Liquid-draining from the drain cup 41 and gas-exhausting from the exhaust cup 42 are performed independently of each other.

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