| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition for efficiently forming a highly permanent pattern by including a dendritic branch compound having a polymerization group as a polymerization compound, having excellent sensitivity, excellent resolution, and excellent hardening characteristics as a permanent protective film, and having small exudation (end face fusion) of the photosensitive composition from a filmed roll, and to provide a photosensitive film, a photosensitive laminate, a permanent forming method using the photosensitive laminate, and a printed circuit board forming a permanent pattern by the permanent forming method. <P>SOLUTION: The photosensitive composition includes the dendritic branch compound having the polymerization compound by including a binder, the polymerization compound, a photo-initiator and a thermal crosslinking agent. The photosensitive film, and the photosensitive laminate are provided. In addition, the permanent pattern forming method using the photosensitive laminate and the printed circuit board forming the permanent pattern by the permanent pattern forming method are provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
