| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photoreactive group-containing siloxane compound imparting scratch resistance, crack resistance, a stainproofing effect of preventing staining by staining materials and wiping properties for a permanent marker to a substrate, provide a process for producing the photoreactive group-containing siloxane compound, and provide a photocurable resin composition and an article having a cured film of the photocurable resin composition. <P>SOLUTION: The photoreactive group-containing siloxane compound is produced by subjecting a system comprising (a) a photoreactive group-containing alkoxy silane being either one kind or two or more kinds selected from the group consisting of photoreactive group-containing alkoxy silanes of formulae (1)-(5) wherein in the case of one kind of photoreactive group-containing alkoxy silane, it is a trialkoxysilane and in the case of two or more kinds thereof, it is constituted of 70 mol% or more trialkoxysilane and (b) a dimethyl siloxane containing hydrolyzable groups at both ends represented by formula (6) to hydrolytic condensation with an excess of water over that required to complete the hydrolytic condensation of all the alkoxy groups in the presence of a basic catalyst. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
