| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus and a vacuum processing method capable of enhancing the productivity by shortening the time required for conveying a substrate, and reducing generation of particles. SOLUTION: The vacuum processing apparatus comprises load lock chambers 2A, 2B, processing chambers 3A, 3B, a core chamber 4 for delivering a substrate to be treated between the load lock chambers and the processing chambers, first gate valves 11A, 11B for partitioning the load lock chambers and the processing chambers, second gate valves 12A, 12B for partitioning the core chambers and the processing chambers, and a pressure controlling mechanism for maintaining the pressure in the core chamber to be at a predetermined value by introducing a pressure controlling gas in the core chamber. When controlling the pressure in the core chamber, the first valve is opened and the second valve is closed. When delivering the substrate to/from the treatment chambers, the open state of the first valve is maintained, and the second valve is opened when the pressure in the core chamber and the pressure in the load lock chambers are higher than the pressure in the processing chambers. COPYRIGHT: (C)2008,JPO&INPIT
|
