| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical proximity correction method that can reduce the cost in the case of its application to the processing status where the lithographic method is changed. <P>SOLUTION: When an optical proximity effect is corrected for image formation of a pattern, which has been arranged on an object surface, on an image surface by a projection objective lens, optical filtering used for the image formation is adapted to the pattern by at least one OPC filter inserted between the object surface and the image surface and is performed according to an OPC filter function corresponding to spatial-dependent transparent filtering in the pupil surface region of an image formation system. In this case, the contour of a pupil transmission function is adapted to a pattern characterized by the position of order of diffraction of a mask by the OPC filter. As a result, it becomes possible to have an optimum pupil transmission rate that can minimize linewidth variation depending on the linear density on the image surface for all orders of diffraction that contribute to the image formation. <P>COPYRIGHT: (C)2008,JPO&INPIT |
