| 摘要 |
PROBLEM TO BE SOLVED: To provide an image sensor and a method of fabricating the same. SOLUTION: The method of fabricating the image sensor includes forming at least one gate on a substrate, and forming first, second and third layers on the at least one gate. The method includes first etching at least a portion of the third layer, by using the second layer as an etching stop layer, exposing at least a portion of the second layer, and second etching at least the exposed portion of the second layer, by using the first layer as an etching stop layer. COPYRIGHT: (C)2008,JPO&INPIT
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