发明名称 STAGE DEVICE, EXPOSURE APPARATUS, AND MICRODEVICE MANUFACTURING METHOD
摘要 <p>A stage device, an exposure device and a manufacturing method of a micro device are provided to improve a positioning accuracy of the stage and a exposure accuracy by reducing measuring error of a interference system according to a temperature variation. A stage driver(11) is able to be moved along a base(12) without contacting with the base. Interference systems(15,16,17) are constituted to measure a position of the stage driver. A stage driver comprises at least one pipe lines or wirings which are connected to the stage driver, and at least one heat insulating material or a heat reclamation unit which are composed to reduce the heat transmitting to a space where a measured light of the interference system is passed from the pipe lines and wirings.</p>
申请公布号 KR20070113992(A) 申请公布日期 2007.11.29
申请号 KR20070050109 申请日期 2007.05.23
申请人 CANON KABUSHIKI KAISHA 发明人 SATO HITOSHI;SASAKI YASUHITO;EMOTO KEIJI
分类号 H01L21/027 主分类号 H01L21/027
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