发明名称 APPARATUS AND METHOD FOR ELECTROPLATING
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a plated layer on a disk by electroplating by which in-plane uniformity of the plated film thickness on the disk is realized by use of a simple device and both sides of disks totaling at eight surfaces can be plated at once. SOLUTION: A feeding jig is used as a cathodic electrode 1, to which electric current is fed via a feeding ring from the outer circumference of the disk. Anode electrodes 3 are disposed oppositing the cathodic electrode 1 on its both sides. Electric shield plates 2 having circle apertures are disposed horizontally to both of the cathodic electrode 1 and the anode electrodes 3. Electroplating is performed while plating liquid is flown onto the feeding jig at a uniform flow rate by an agitating nozzle 4. A part of the feeding ring is released to secure a secondary cathodic function. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007308783(A) 申请公布日期 2007.11.29
申请号 JP20060141168 申请日期 2006.05.22
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ITO KIYOSHI;TAKESHITA HIROYUKI
分类号 C25D7/12;C25D17/06;C25D17/10;C25D21/10 主分类号 C25D7/12
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