发明名称 BASE CLOTH FOR SKIN PATCH
摘要 PROBLEM TO BE SOLVED: To provide a base cloth for skin patch having superior transparency and having equal elasticity to that of a conventional product. SOLUTION: In a rib knitting tissue where a wale row of a face stitch and a wale row of a back stitch are alternately positioned, a back stitch wale of a second knitting fabric is superposed under the front stitch wale of a first knitting fabric and the front stitch wale of the second knitting fabric is superposed on the back stitch wale of the first knitting fabric with their courses alternately accorded and superposed, and a sinker loop of the first knitting fabric and a sinker loop of the second knitting fabric are crossed between the wales to provide transparent routes partitioned by the sinker loops between the wales for every course and improve the transparency of the knitting fabric. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007306983(A) 申请公布日期 2007.11.29
申请号 JP20060136719 申请日期 2006.05.16
申请人 FUJIBO HOLDINGS INC;TEIJIN MODERN YARN CO LTD 发明人 NAKASE KEISUKE;OKUBO SEIU;YOSUKE YUKINORI
分类号 A61F13/00;A61F13/02;D04B1/22 主分类号 A61F13/00
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