发明名称 Interconnection structure and manufacturing process
摘要 This invention relates to a process for manufacturing interconnection structures, including: a) the formation on a substrate of a first layer comprising one or several conducting zones ( 24 ) and one or several insulating zones made of an organic material ( 26 ), b) coverage of this first layer by a porous layer ( 28 ), c) consumption and elimination of at least part of the organic material through the porous layer, using enzymes and/or proteins.
申请公布号 US2007275261(A1) 申请公布日期 2007.11.29
申请号 US20070702697 申请日期 2007.02.05
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 LOUIS DIDIER
分类号 C12P1/00;B32B5/14;C12P7/40;C12P19/04 主分类号 C12P1/00
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