发明名称 |
OVERLAY MEASUREMENT TARGET |
摘要 |
<p>In an overlay metrology method used during semiconductor device fabrication, an overlay alignment mark facilitates alignment and/or measurement of alignment error of two layers on a semiconductor wafer structure, or different exposures on the same layer. A target is small enough to be positioned within the active area of a semiconductor device combined with appropriate measurement methods, which result in improved measurement accuracy.</p> |
申请公布号 |
KR20070114109(A) |
申请公布日期 |
2007.11.29 |
申请号 |
KR20077011444 |
申请日期 |
2005.10.11 |
申请人 |
NANOMETRICS INCORPORATED;INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
SMITH NIGEL PETER;KU YI SHA;PANG HSUI LAN |
分类号 |
G01B11/00;H01L21/76;H01L23/544 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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