| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive dry film resist which can be developed with an aqueous developer and excels in resolution, flame retardancy, adhesion, moisture resistance, electric reliability and storage stability, and a method for applying the same. <P>SOLUTION: The photosensitive dry film resist has a multilayer structure including at least a first photosensitive layer and a second photosensitive layer, wherein the first photosensitive layer contains (A1) a binder polymer, (B1) a (meth)acrylic compound, (C1) a photoreaction initiator, (D1) a flame retardant and (E1) a polymerization inhibitor, the second photosensitive layer contains (A2) a binder polymer, (B2) a (meth)acrylic compound, (C2) a photoreaction initiator, (D2) a flame retardant and (E2) a polymerization inhibitor, the second photosensitive layer has a flame retardant content of 0-10%, when the flame retardant content of the first photosensitive layer is considered to be 100, the flame retardant content of the second photosensitive layer is 0-50, and the amount of residual solvents in the entire resist including at least the first photosensitive layer and the second photosensitive layer is ≤5%. <P>COPYRIGHT: (C)2008,JPO&INPIT |
