| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspecting device and an inspecting method that remove a fine defect desirous of being ignored which originates from an OPC pattern of a scattering bar etc., in defect inspection of a mask with a pattern, and a manufacturing method for a pattern substrate using the inspecting device and inspecting method. <P>SOLUTION: The inspecting device includes a filter generator which generates an OPC filter masking an OPC area corresponding to the 0PC pattern by using a first image and a second image, a high-sensitivity defect candidate detector which detects a defect candidate with high sensitivity from a result of comparison between the first image and the second image, a low-sensitivity detect candidate detector which detects a defect candidate with low sensitivity from the result of comparison between the first image and the second image, and a defect judgement unit which uses the OPC filter to judge the low-sensitivity defect candidate detected by the low-sensitivity defect candidate detector as a defect in the OPC area. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
