| 摘要 |
PROBLEM TO BE SOLVED: To provide a development processing method for a substrate, the method preventing such a phenomenon that an eluted component from a resist by development is diffused in a developer solution to induce inhomogeneous development, and improving uniformity in the pattern dimension. SOLUTION: When a resist film is developed by applying a developer solution on an exposed resist film formed on the surface of a substrate, the developer solution used is a mixture chemical containing a water-soluble resin. By the water-soluble resin included in the developer solution applied on the resist film on the substrate surface, the component eluted from the resist by the development is prevented from diffusing in the developer solution. COPYRIGHT: (C)2008,JPO&INPIT |
