MANUFACTURING METHOD FOR CLEANING SHEET AND FOR TRANSFER MEMBER WITH CLEANING FUNCTION, AND CLEANING METHOD FOR SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide manufacturing methods for cleaning sheet and transfer member with cleaning function which are superior in foreign matter removing performance and transfer performance, and can suppress contamination caused by a silicon compound in a cleaning layer, and to provide a cleaning method for substrate processing device using such a cleaning sheet and a transfer member with cleaning function as above. SOLUTION: In the cleaning layer, relative strengths (a positive ion is a C2H3+ratio, and a negative ion is an O-ratio) of a specified fragment ion of the cleaning layer are 0.1 or less respectively in a time-of-flight type secondary ion mass spectrometry. In the manufacturing method for cleaning sheet, plasma treatment is performed for the cleaning layer wherein the relative strength (the positive ion is the C2H3+ratio, and the negative ion is the O-ratio) of at least one fragment ion of the specified fragment ions is 0.1 or less in the time-of-flight type secondary ion mass spectrometry. COPYRIGHT: (C)2008,JPO&INPIT