摘要 |
Rectangular patterns are recorded on a substrate along a direction in which the substrate is moved and a direction perpendicular to the direction. Line widths of the rectangular patterns are measured, and mask data are established for obtaining amounts of light to correct changes in the line widths. When exposure heads are energized to record an image on the substrate by way of exposure, the mask data depending on a moved position of the substrate are read from a mask data memory, and applied to correct the output data for thereby recording a desired locality-free image on the substrate.
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