| 摘要 |
A method for calculating a correction amount to a focus amount or an exposure dose in exposing a substrate with an exposure apparatus includes a storing step of storing plural sets, each of which is a combination of a set focus amount, a set exposure dose, and first image information of a pattern formed on the substrate through an exposure with the set focus amount and the set exposure dose, the plural sets having different focus amounts and/or different exposure doses, an obtaining step of obtaining second image information of a pattern formed on the substrate through another exposure, and a selecting step of finding a correlation value between the second image information obtained in the obtaining step and the first image information in the plural sets stored in the storing step, and of selecting at least two sets having two highest correlation values among the plural sets.
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