STRIPPER COMPOSITION FOR PHOTORESIST

摘要

A photoresist stripper composition, a method for stripping a photoresist containing aluminum copper or aluminum and copper on a substrate by using the composition, and a method for preparing a liquid crystal display device and a semiconductor device by using the stripping method are provided to remove a photoresist layer without damaging an under conductive layer or an insulating layer even if isopropanol is not used. A photoresist stripper composition comprises at least one corrosion inhibitor selected from the group consisting of compounds represented by the formulae 1, 2 and 3; a water-soluble organic amine compound in an amount of 2-50 times to the amount of the corrosion inhibitor by weight; and a polar solvent, wherein R1 and R2 are identical or different each other and are independently H or OH; R3 is H, a t-butyl group, a carboxyl group, a methyl ester group, an ethyl ester group, or a propyl ester group; r4 is H or a C1-C4 alkyl group; and R5 and R6 are identical or different each other and are independently a C1-C4 hydroxyalkyl group.