| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask which is prevented from producing foreign matter when used. <P>SOLUTION: The photomask has a transparent substrate 2, a pattern 4 for transfer formed in a main area 3 at a center part of the transparent substrate 2, a light shielding zone area 5 which is provided in an outer circumferential area of the main area 3 adjacent to the main area 3, and a pellicle 6 formed by bonding a pellicle film 6a to a pellicle ring 6b with an adhesive 8a, and the pellicle 6 is bonded onto a light shield area 7, made of a light shielding film formed in the outer circumferential area of the main area 3, via an adhesive 8b. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
