发明名称 CLUSTER TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cluster treatment device capable of completely protecting a steel layer from oxide formation. SOLUTION: The cluster treatment device includes: a casing 200; at least one treatment chamber 210; a robot 220; and at least one of valves 230, 240. The casing 200 includes gas inside the casing, and has at least one door 203 for putting a lid on the opening of the casing. The gas contains at least one reducing gas. The robot 220 is provided in the casing 200, and conveys a substrate 270 between the door 203 and the treatment chamber 210. The valves 230, 240 are connected to the casing 200. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007311745(A) 申请公布日期 2007.11.29
申请号 JP20060304358 申请日期 2006.11.09
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD 发明人 YU CHEN-HUA;TSAI MING-HSING;HSIAO YI-LI
分类号 H01L21/677;H01L21/28;H01L21/285;H01L21/288 主分类号 H01L21/677
代理机构 代理人
主权项
地址