| 摘要 |
PROBLEM TO BE SOLVED: To provide a colored base material manufacturing method capable of manufacturing a colored base material for a substrate consisting of a plastic resin having low heat resistance at a low reaction temperature at a high film deposition rate. SOLUTION: A film raw material is deposited on a surface of a substrate consisting of a plastic resin by sputtering targets 22a, 22b in a film deposition process area 20A in a vacuum container 11. The substrate S is conveyed into a reaction process area 60A formed at the position separate from the film deposition process area 20A, and a nitride of the film raw material is generated by introducing reactive gas into the reaction process area 60A to generate plasma of the reactive gas. Since the film deposition process area 20A and the reaction process area 60A are formed at the positions separate from each other, abnormal discharge hardly occurs by the nitriding of the targets 22a, 22b, the nitriding reaction can be promoted by the plasma processing even when the temperature of the substrate S is not raised, and film deposition can be achieved even on a plastic resin material having low heat resistance. COPYRIGHT: (C)2008,JPO&INPIT
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