| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a polishing pad having a small number of manufacturing processes and superior productivity; and to provide a manufacturing method of a laminated polishing pad having a small number manufacturing processes and superior productivity and preventing peeling between a polishing layer and a cushion layer. <P>SOLUTION: This manufacturing method of the polishing pad includes a process for preparing foam-dispersion urethane composition by a mechanical foaming method, a process for sending out a face material and at the same time, continuously discharging the foam-dispersion urethane composition thereon, a process for stacking another face material on the foam-dispersion urethane composition, a process for hardening the foam-dispersion urethane composition while uniformly adjusting the thickness and forming a polishing layer consisting of a polyurethane foam body, a process for cutting the polishing layer into two in parallel to the surface and simultaneously fabricating two long polishing layers consisting of the polishing layer and the face material, and a process for cutting the long polishing layer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
