发明名称 Microwave Plasma Apparatus
摘要 A microwave plasma generating apparatus ( 10 ) has a microwave cavity ( 20 ) coupled to a microwave source ( 22 ) by a wave guide ( 24 ). Within the cavity (20) is a reaction tube ( 30 ) defining a plasma cavity ( 40 ). A gas inlet manifold ( 50 ) is provided at the top of the reaction tube ( 30 ), which is formed so as to introduce plasma gas tangentially to the longitudinal axis of the plasma. Plasma gas is thus injected into the reaction tube ( 30 ) so that it flows in a swirled manner, that is, in the form of a vortex. This prevents overheating of the reaction tube ( 30 ).
申请公布号 US2007274893(A1) 申请公布日期 2007.11.29
申请号 US20050664667 申请日期 2005.10.03
申请人 C-TECH INNOVATION LIMITED 发明人 WRIGHT NEIL P.;DUAN XIAOMING;PHAN BA D.
分类号 H05H1/30;H01J37/32 主分类号 H05H1/30
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