发明名称 POLISHING CLOTH AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To reduce scratches on an object to be polished in finish polishing. <P>SOLUTION: A base material layer 2 formed of a nonwoven fabric, an intermediate layer 4 formed of a resin film on this base material layer 2, and a nap layer 5 directly formed on this intermediate layer 4 are provided. Fiber 7 forming the nonwoven fabric of the base material layer 2 is prevented from entering the nap layer 5 side by the intermediate layer 4, and thus, the fiber 7 forming the non-woven fabric is prevented from entering the nap layer 5 which is a polishing layer, or going through it. This reduces the scratches on the object to be polished caused by the fiber 7 of the base material layer 2. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007307641(A) 申请公布日期 2007.11.29
申请号 JP20060137628 申请日期 2006.05.17
申请人 NITTA HAAS INC 发明人 YAMAMOTO KEIJI;YOSHIDA KOICHI;ONO HIROSHI
分类号 B24B37/20;B32B5/22;D06M15/564;D06M17/00;H01L21/304 主分类号 B24B37/20
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