| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor phase deposition film manufacturing method, a vapor phase deposition film manufacturing apparatus, and a radiation image conversion panel manufacturing method capable of manufacturing a radiation image conversion panel suppressing occurrence of point defects or the like and obtaining an image of high quality with less defects. SOLUTION: The radiation image conversion panel manufacturing method comprises a step of checking the surface state of a substrate before vapor deposition after a vacuum chamber is evacuated while a substrate is set in the vacuum chamber of a vacuum vapor deposition apparatus, and a step of depositing a fluorescent body layer on the surface of the substrate. Here, the step of checking the surface state of the substrate is preferably performed by a surface state inspection means. COPYRIGHT: (C)2008,JPO&INPIT
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