| 摘要 |
A plasma reactor having an internal radio frequency antenna is provided to simultaneously process two sheets of substrates in parallel by using two vacuum chambers. A plasma generating section(300) has at least one antenna unit(310), and two vacuum chambers(200) are connected to both sides of the plasma generating section. The vacuum chambers accommodate the plasma generated by the plasma generating section, respectively, to carry out plasma process of a substrate to be processed. At least two antenna unit has a flat antenna protection cover(311) and an antenna bundle(313) built in the antennal protection cover. |
