发明名称 |
METHOD FOR MANUFACTURING THREE-DIMENSIONAL PHOTONIC CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a highly uniform three-dimensional photonic crystal having a large surface area. SOLUTION: The method for manufacturing the three-dimensional photonic crystal containing fine particles as constitutive unit is characterized in that a fine particle slurry is supplied onto a template substrate (Q) having recesses to form a layer (A) having a fine particle accumulation body having a shape according to the shape of each recess, and further a continuous fine particle accumulation body layer (A') is formed on the layer (A). It is preferable that the recess formed in the template substrate (Q) is a V-shaped recess having (111) plane on its surface, produced by anisotropically etching a silicon substrate whose surface is (100) plane or (110) plane. It is further preferable that the distance between recesses is 0 or an integral multiple of the diameter of the fine particle being constitutive unit. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007310038(A) |
申请公布日期 |
2007.11.29 |
申请号 |
JP20060137153 |
申请日期 |
2006.05.17 |
申请人 |
HOKKAIDO UNIV;SANYO CHEM IND LTD |
发明人 |
MISAWA HIROAKI;UENO TSUGUO;TANIMURA TOSHIHIRO |
分类号 |
G02B1/02;G02B6/12;G02B6/13 |
主分类号 |
G02B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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