发明名称 METHOD FOR MANUFACTURING THREE-DIMENSIONAL PHOTONIC CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a highly uniform three-dimensional photonic crystal having a large surface area. SOLUTION: The method for manufacturing the three-dimensional photonic crystal containing fine particles as constitutive unit is characterized in that a fine particle slurry is supplied onto a template substrate (Q) having recesses to form a layer (A) having a fine particle accumulation body having a shape according to the shape of each recess, and further a continuous fine particle accumulation body layer (A') is formed on the layer (A). It is preferable that the recess formed in the template substrate (Q) is a V-shaped recess having (111) plane on its surface, produced by anisotropically etching a silicon substrate whose surface is (100) plane or (110) plane. It is further preferable that the distance between recesses is 0 or an integral multiple of the diameter of the fine particle being constitutive unit. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007310038(A) 申请公布日期 2007.11.29
申请号 JP20060137153 申请日期 2006.05.17
申请人 HOKKAIDO UNIV;SANYO CHEM IND LTD 发明人 MISAWA HIROAKI;UENO TSUGUO;TANIMURA TOSHIHIRO
分类号 G02B1/02;G02B6/12;G02B6/13 主分类号 G02B1/02
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