| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment system which removes particles stuck to a carrying arm of a substrate carrying apparatus, and to provide a cleaning method of the carrying arm, and a recording medium. SOLUTION: The treatment system which treats a substrate W is provided with the substrate carrying apparatus 30 which carries the substrate W by holding it with the carrying arm 35; an approach S1 which the carrying arm 35 is made to enter; and an entrance 131 for making the carrying arm 35 enter the approach S1. Over the moving area of the carrying arm 35 at the entrance 131, a gas discharging port 183 is provided which discharges gas for cleaning downward. By this constitution, the particles stuck to the carrying arm 35 can be blown away to be removed with the gas for cleaning. COPYRIGHT: (C)2008,JPO&INPIT
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