| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of cleaning the inside of an apparatus which is contaminated by a composition for peeling that is used in combination with a high-pressure fluid such as a supercritical fluid when peeling resist or the like. SOLUTION: When cleaning amines and fluorides adhered to the inside of an apparatus for cleaning a high-pressure fluid, a cleaning liquid comprised of sulphuric acid, organic solvent and suprecritical carbon dioxide is used for cleaning the inside of the apparatus. COPYRIGHT: (C)2008,JPO&INPIT
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