| 摘要 |
The present invention relates to a showerhead that supplies a source gas and a supporting gas for depositing a film into a processing vessel of a film deposition apparatus. The showerhead includes a body which is provided with a gas jetting surface ( 8 ). In the showerhead body, there are defined a first diffusion chamber ( 60 ) that receives the source gas and diffuses the same, and a second diffusion chamber ( 62 ) that receives the supporting gas and diffuses the same. The gas jetting surface has source-gas jetting orifices ( 10 A) that are in communication with the first diffusion chamber, and first supporting-gas jetting orifices ( 10 B) that are in communication with the second diffusion chamber. Each of the first supporting-gas jetting orifices ( 10 B) are formed into a ring shape that adjacently surrounds a corresponding one of the source-gas jetting orifices ( 10 A).
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