| 摘要 |
A laser multiplexing system and method for use with high power pulsed lasers in Extreme Ultraviolet Lithography is disclosed. In a first embodiment, a high power EUV laser multiplexing element for laser produced plasma generation has a compound lens with at least two focusing elements arranged to focus at least two respective laser beams to a focal point on a common workpiece. In a second embodiment, a laser multiplexing apparatus has at least two pulsed laser sources for generating pulsed laser beams and a temporal multiplexing element arranged to temporally interleave at least two pulsed laser beams. In a third embodiment, a laser multiplexing assembly comprises a beam shaping element in which the beam shaping element is arranged to direct a first laser beam along an axis common with a second laser beam axis onto a common focusing element arranged about the common axis.
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