发明名称 METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL
摘要 <p>A method for the production of an SiC single crystal includes the steps of growing a first SiC single crystal in a first direction of growth on a first seed crystal formed of an SiC single crystal, disposing the first SiC single crystal grown on the first seed crystal in a direction parallel or oblique to the first direction of growth and cutting the disposed first SiC single crystal in a direction of a major axis in a cross section perpendicular to the first direction of growth to obtain a second seed crystal, using the second seed crystal to grow thereon in a second direction of growth a second SiC single crystal to a thickness greater than a length of the major axis in the cross section, disposing the second SiC single crystal grown on the second seed crystal in a direction parallel or oblique to the second direction of growth and cutting the disposed second SiC single crystal in a direction of a major axis in a cross section perpendicular to the second direction of growth to obtain a third seed crystal, using the third seed crystal to grow thereon a third SiC single crystal, and cutting the third SiC single crystal grown on the third seed crystal in such a manner as to expose a {0001} crystal face, thereby obtaining an SiC single crystal. The method enables the crystal to be enlarged efficiently without impairing crystallinity.</p>
申请公布号 WO2007135965(A1) 申请公布日期 2007.11.29
申请号 WO2007JP60169 申请日期 2007.05.10
申请人 SHOWA DENKO K.K.;OYANAGI, NAOKI;SYOUNAI, TOMOHIRO;SAKAGUCHI, YASUYUKI 发明人 OYANAGI, NAOKI;SYOUNAI, TOMOHIRO;SAKAGUCHI, YASUYUKI
分类号 C30B29/36;C30B23/00 主分类号 C30B29/36
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