发明名称 |
THE FABRICATING METHOD OF ANATASE PHASE TITANIUM OXIDE LAYER |
摘要 |
A fabricating method of a titanium oxide film with improved bond strength with a matrix is provided, a fabricating method of a titanium oxide film with improved photocatalytic characteristics is provided, and a fabricating method of a titanium oxide film is provided to form a densified film by reducing porosity of the film. A fabricating method of a titanium oxide film comprises: a step(a) of preparing a slurry comprising titanium oxide(TiO2) nanoparticles in an anatase phase; a step(b) of drying the slurry at a temperature of 180 to 200 deg.C to prepare a titanium oxide powder with a particle size of several tens of micrometers(mum); a step(c) of pre-treating a matrix by a mechanical polishing process or a degreasing process; and steps(d,e) of performing plasma spray coating of the titanium oxide powder by using argon gas with 75 to 100 SCFH/60 to 100 psi and hydrogen gas with 5 to 10 SCFH/30 to 100 psi and adjusting a spraying distance to 40 to 150 mm, and forming a titanium oxide film on the matrix.
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申请公布号 |
KR100779490(B1) |
申请公布日期 |
2007.11.26 |
申请号 |
KR20060075552 |
申请日期 |
2006.08.10 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YEUNGNAM UNIVERSITY |
发明人 |
CHOI, SOON DON;LEE, HAE DUK;KIM, CHUL HONG;CHOI, KI DUK |
分类号 |
C23C4/10 |
主分类号 |
C23C4/10 |
代理机构 |
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