APPARATUS FOR BAKING A SUBSTRATE

摘要

A bake apparatus is provided to enhance efficiency of a bake process and to shorten a bake process time by controlling a discharging state of internal gas of a chamber. A discharge buffer(115) is connected to a bake chamber(105). A discharge tube(140) is connected to the discharge buffer. A damper unit(120) is installed in the discharge tube in order to control a sectional area of the discharge tube. The damper unit includes a sectional shape control part supported by an inner circumference of the discharge tube in order to control a sectional shape of the discharge tube, and a sectional area control part for controlling a sectional area of the discharge tube. The damper unit is formed with a plurality of damper parts. A valve(130) is positioned in the discharge tube in order to open or close the discharge tube.