SEMICONDUCTOR DEVICE FABRICATION EQUIPMENT WITH SHOWERHEAD

摘要

A semiconductor device manufacturing facility having a shower head is provided to supply a process gas as a required proportion for improving process uniformity by eliminating rectilinear propensity of the process gas flowed into an inner space of the shower head through a gas supply port. A semiconductor device manufacturing facility includes a stage for placing a substrate and a shower head(100) to supply a process gas to the substrate. The shower head includes a top plate(247), a bottom plate(210) having a plurality of injection holes, and an intermediate plate(249) dividing a space between the top and the bottom plates again upward and downward based on the longitudinal direction. A plurality of distributed connection holes are formed on the intermediate plate, entrances of the connection holes are protruded upwardly.