Method of forming a device isolation film in a semiconductor device,申请号KR20010036739-传众专利搜索

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发明名称	Method of forming a device isolation film in a semiconductor device
摘要
申请公布号	KR100779398(B1)	申请公布日期	2007.11.23
申请号	KR20010036739	申请日期	2001.06.26
申请人		发明人
分类号	H01L21/76	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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