| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing liquid composition capable of providing small surface roughness of an object to be polished after polishing and remarkably reducing nanoscratches, and a manufacturing method of a substrate having small surface roughness and remarkably reduced nanoscratches. <P>SOLUTION: This polishing liquid composition contains a polishing material having an average particle diameter≥1 nm and <40 nm of primary particles. A zeta potential of the polishing material in the polishing liquid composition is -15 to 30 mV. In this manufacturing method of the substrate, a polishing process using the polishing liquid composition having the zeta potential adjusted to -15 to 30 mV of the polishing material is provided. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
