发明名称 CLEANING DEVICE FOR SILICON WAFER
摘要 PROBLEM TO BE SOLVED: To prevent stain due to sticking of silicon wafers by draining treat water corresponding to change of thickness and outline dimension of the silicon wafer without fail. SOLUTION: This device comprises a traveling cart 33, an elevating plate 36 provided to the traveling cart 33 via an elevating cylinder 34 while elevating is allowed, and a clamp 38 provided to the plate 36 for clamping a basket B. The clamp 38 is supported between supporting plates 39 and 40 provided to the elevating plate 36 via a revolving shaft 41 while rocking is allowed, and an inclining cylinder 48 for making the clamp 38 rock from a horizontal position to a rocking inclining position is provided to the elevating plate 36. Meanwhile, a connection position changing means 50 can change a connection position of the inclining cylinder 48 and the clamp 38, by changing the connection position of the inclining cylinder 48 and the clamp 38, and inclination angle of the clamp 38 can be adjusted at the rocking inclining position when the inclining cylinder 48 is extended. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007305949(A) 申请公布日期 2007.11.22
申请号 JP20060159043 申请日期 2006.05.11
申请人 ORIENTAL KOGYO KK 发明人 MIYAI HIROSUKE
分类号 H01L21/304 主分类号 H01L21/304
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