发明名称 Method for forming poly-silicon film
摘要 A method for forming a poly-silicon film, using sequential lateral solidification (SLS) by laser irradiation through an optical device to pattern the laser beam and provide a periodic energy profile on the edges of transparent regions so as to widen the poly-silicon grains and achieve grain size uniformity. The optical device comprises a plurality of first transparent regions with a length of L, wherein at least one side of the edge of each of the first transparent regions has a first periodic shape.
申请公布号 US2007269993(A1) 申请公布日期 2007.11.22
申请号 US20060601689 申请日期 2006.11.20
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHU FANG-TSUN;LIN JLA-XING
分类号 H01L21/00 主分类号 H01L21/00
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