发明名称 Verfahren zur Lötstopp-Strukturierung von Erhebungen auf Wafern
摘要 Process for solder-stop structuring protrusions on wafers (3) such as three dimensional contact structures (1) in the form of elastic or flexible contact bumps comprises depositing a resist on the tip of the three dimensional structure, depositing a solder-stop layer over a metallization including the resist, and removing the resist on the tip of the three dimensional structure including the solder-stop layer covering it.
申请公布号 DE10241589(B4) 申请公布日期 2007.11.22
申请号 DE2002141589 申请日期 2002.09.05
申请人 QIMONDA AG 发明人 BRINTZINGER, AXEL;UHLENDORF, INGO;SCHENK, ANDRE;WOLLANKE, ALEXANDER
分类号 H01L21/60;H01L21/44;H01L23/485 主分类号 H01L21/60
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