METHOD OF FORMING POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING UTILIZING LASER SINTERING

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a polishing pad for porous chemical mechanical polishing.

SOLUTION: This method includes a process for forming a sintering chamber by drawing a drawable surface and a process for distributing thermoplastic particles having an average particle diameter of 5 to 500 microns to the sintering chamber via a dispenser. The method further includes a process for focusing a laser beam from a laser on the thermoplastic particles and a process for selectively sintering the thermoplastic particles with the laser beam.

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