| 发明名称 |
APPARATUS FOR LITHOGRAPHY AND METHOD OF LITHOGRAPHY |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern onto a non-traditional substrate by a novel method with use of a novel substrate carrier and a substrate carrier. <P>SOLUTION: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in a given position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate. According to a second aspect, there is provided a method of removably securing a substrate to a substrate carrier, including: positioning a substrate on the substrate carrier so that a sealed space can be defined between the substrate and the substrate carrier; and establishing a vacuum in the space between the substrate and the substrate carrier. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2007305989(A) |
申请公布日期 |
2007.11.22 |
| 申请号 |
JP20070120775 |
申请日期 |
2007.05.01 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN DER BRINK ENNO;VAN BUEL HENRICUS WILHELMUS MARIA;CONSOLINI JOSEPH J;KEIJSERS GERARDUS JOHANNES JOSEPH;SIMON KLAUS;DE SMIT JOHANNES THEODOOR;TRAVERS RICHARD JOSEPH;TEUWEN MAURICE ANTON JAQUES;MEESTER ARNOUT JOHANNES;HAFNER FREDERICK WILLIAM;GREENLEE VINYU;BALIENS HUBERTUS ANTONIUS MARINUS |
| 分类号 |
H01L21/683;G03F7/20;H01L21/027 |
主分类号 |
H01L21/683 |
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