| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method capable of efficiently transferring a developer onto an insulating substrate. SOLUTION: A pattern forming device is provided with an intaglio retaining a pattern by a developer, a transferring device transferring patterns 27, 28, 29 developed on the intaglio onto a medium for transfer 31, and a baking furnace 40 for erasing or making high in resistance an electrode layer 32 after the transfer. The patterns 27, 28, 29 developed on the intaglio are transferred on the electrode layer 32 at a side of an opposite face 31a of the medium for transfer 31, and later, the electrode layer 32 are erased by heating it in the baking furnace 40. COPYRIGHT: (C)2008,JPO&INPIT
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