| 摘要 |
<p>A method for repairing a polymer mask is provided to remove defects such as blurs and voids on the polymer mask easily and accurately by using a laser. A transparent polymer substrate(14), which includes first and second surfaces, is provided. An opaque pattern layer is formed on the first surface of the transparent polymer substrate. When a blur defect is detected from the first surface of the polymer substrate, a laser beam is irradiated on the polymer substrate, so that an effective ablation process is performed to remove the blur defects from the first surface. A transparency of the polymer substrate is maintained by using the effective ablation process. A pulsed laser with an irradiance between 10^6 and 10^15W/cm^2 is used to induce the effective ablation process.</p> |
