| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition method capable of obtaining a film having the consistent quality. <P>SOLUTION: A film of a desired quality can be deposited by recognizing the stress direction in front and back faces of a substrate for film deposition and the stress direction of the film in advance, and adequately combining both directions with each other. In other words, one substrate is extracted to be made a substrate for evaluation among a plurality of substrates for film deposition obtained from the same manufacturing lot, and by measuring the stress in the substrate for evaluation, the direction of the residual stress in the front and back faces of the substrate for film deposition in the manufacturing lot can be estimated. When preventing interface peeling by mitigating the film stress, the stress direction in the film is set to be the same as the stress direction in the film-deposited face of the substrate for film deposition. When maintaining flatness of the substrate for film deposition, the stress direction of the film is opposite to the stress direction in the film-deposited face of the substrate for film deposition. <P>COPYRIGHT: (C)2008,JPO&INPIT |
