| 摘要 |
PROBLEM TO BE SOLVED: To provide an antimicrobial monomer of new form including an antimicrobially active imidazolium salt, soluble to water and organic solvent and easily mixable with another monomer, to provide a photocurable and antimicrobial composition, and to provide an antimicrobial polymeric material for surface coating use produced from the composition. SOLUTION: The antimicrobial monomer of new form including an antimicrobially active imidazolium salt is represented by the chemical formula(1) ( wherein, X<SP>-</SP>is an anion selected from the group consisting of chlorine ion, bromine ion, BF<SB>4</SB><SP>-</SP>, PF<SB>6</SB><SP>-</SP>, SbF<SB>6</SB><SP>-</SP>, NO<SB>3</SB><SP>-</SP>, CF<SB>3</SB>SO<SB>3</SB><SP>-</SP>, (CF<SB>3</SB>SO<SB>3</SB>)<SB>2</SB>N<SP>-</SP>, ArSO<SB>3</SB><SP>-</SP>, CF<SB>3</SB>CO<SB>2</SB><SP>-</SP>and CH<SB>3</SB>CO<SB>2</SB><SP>-</SP>; m is an integer of 1-12; R<SP>1</SP>is H or CH<SB>3</SB>; R<SP>2</SP>and R<SP>3</SP>are each an alkyl group of (CH<SB>2</SB>)<SB>x</SB>Y, wherein x is an integer of 0-20 and Y is a halogen atom selected from F, Cl and Br, H, or a functional group selected from NH<SB>2</SB>, OH and CO<SB>2</SB>H ). COPYRIGHT: (C)2008,JPO&INPIT
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