| 摘要 |
<p>Provided is an exposure apparatus by which light is suitably blocked for a non-exposure region, at the time of performing pattern exposure by relatively moving a substrate and a mask. While an exposure region is being exposed, a blind member (20) is shifted to the upstream by having the blind member pass over light (EL) used for exposure. Thus, irrespective of the number of exposure regions, exposure of the non-exposure region can be eliminated by using the one blind member (20).</p> |
